Company underscores its leadership in driving the next era of
EUV lithography
FREMONT,
Calif., June 14, 2022 /PRNewswire/ -- Lam Research
(Nasdaq: LRCX) today announced that SK hynix Inc. has selected
Lam's innovative dry resist fabrication technology as a development
tool of record for two key process steps in the production of
advanced DRAM chips. A breakthrough technology introduced by Lam in
2020, dry resist extends the resolution, productivity, and yield of
Extreme Ultraviolet (EUV) lithography, a pivotal technology used in
the production of next-generation semiconductors.
Lam Research announces that SK hynix has
chosen innovative dry resist technology for production of advanced
DRAM chips.
Through Lam's work with SK hynix and ongoing collaboration
with ecosystem partners on dry resist technology, the company
continues to take a leadership role in driving patterning
innovations to remove the roadblocks associated with scaling to
future memory nodes with EUV lithography.
"Lam's dry resist technology is a game-changer. By innovating at
the material level, it addresses EUV lithography's biggest
challenges, enabling cost-effective scaling for advanced memory and
logic," said Richard Wise, vice president and general manager
of the dry resist product group at Lam. "We are proud to continue
our long-standing collaboration with SK hynix to accelerate DRAM
technology innovations."
SK hynix intends to use Lam's dry resist underlayer and dry
development processes for advanced DRAM patterning. "As DRAM
continues to scale, innovations in EUV patterning are critical for
delivering the performance needed for today's increasingly
connected devices at a cost that is right for our customers," said
BK Lee, head of R&D process at SK hynix. "The dry resist
technology that we are working on with Lam enables exceptionally
precise, low defect, and lower cost patterning."
As chipmakers move to advanced technology nodes, they must
resolve ever smaller and finer chip designs on the wafer. First
developed by Lam in collaboration with ASML and IMEC, dry resist
technology offers several advantages over conventional chemically
amplified resist patterning for EUV lithography. Dry resist
technology solutions significantly enhance EUV sensitivity and the
resolution of each wafer pass, enabling patterns to better adhere
to the wafer and improving performance and yield. In addition,
Lam's dry resist development approach offers key sustainability
benefits by consuming less energy and five to ten times less
raw materials than traditional chemical wet resist processes.
Additional Media Resource: Why New Photoresist
Technology Is Critical
About Lam Research
Lam Research Corporation (NASDAQ: LRCX) is a global supplier of
innovative wafer fabrication equipment and services to the
semiconductor industry. Lam's equipment and services allow
customers to build smaller and better performing devices. In fact,
today, nearly every advanced chip is built with Lam technology. We
combine superior systems engineering, technology leadership, and a
strong values-based culture, with an unwavering commitment to our
customers. Lam Research is a FORTUNE 500® company headquartered in
Fremont, California, with
operations around the globe. Learn more at www.lamresearch.com
(LRCX-P).
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SOURCE Lam Research Corporation