Atomera Collaborates With the Center for Integrated Nanotechnologies (CINT) at Sandia National Laboratories to Validate MST’s Ability to Address GaN Manufacturing Challenges
09 October 2024 - 8:05AM
Business Wire
CINT’s state-of-the-art facilities will enable
Atomera to quickly evaluate the effectiveness of GaN transistors
utilizing MST
Atomera Incorporated (NASDAQ: ATOM), a semiconductor materials
and technology licensing company, today announced a user project at
the Center for Integrated Nanotechnologies (CINT) at Sandia
National Laboratories, a Department of Energy, Office of Science,
Nanoscale Science Research Center, to address the challenges of
growing Gallium Nitride (GaN) films on Silicon (Si). This project
aims to create the world’s first GaN transistors and test data from
wafers employing Atomera’s Mears Silicon Technology™ (MST®). The
effort will build upon improvements already observed at the
materials level in GaN/MST on Silicon wafers.
“Atomera’s MST represents a tremendous opportunity to improve
GaN on Si manufacturing and provide speed, efficiency and
cost-saving benefits to a wide range of industries including
electronics, RF/microwave electronics and even MicroLEDs. This user
project will test the effectiveness of the MST solution quickly
using CINT’s highly specialized tools and technology and give
Atomera access to our team of scientists and researchers,” said
Jeffrey Nelson, director of CINT.
Due to the limited availability and size of native substrates,
most GaN devices have been grown heteroepitaxially on sapphire,
silicon carbide or Si substrates. Although impressive performance
has been achieved with each of these, only Si substrates offer a
clear pathway to large wafer size, low cost and compatibility with
well-established CMOS wafer fabrication lines. However, there are
significant challenges, including wafer warping or cracking,
associated with the growth of thick GaN films on Si (GaN/Si),
particularly at large wafer sizes.
“Over the past approximately 25 years, GaN has transformed
multiple industries, including lighting, RF/microwave and power
electronics, but manufacturing limitations have hindered the
widespread adoption of GaN for modern power electronics,” said
Shawn Thomas, vice president of Marketing & Business
Development at Atomera. “This user project with Sandia Labs will
allow Atomera to fabricate devices and collect data to validate the
mechanical and electrical benefits of MST-enhanced GaN on Si.”
Managing stress is the most important aspect of growing thick
GaN epi on Si. Commercially available GaN on Si power electronics
(PE) devices are currently limited to a ~650V rating due to the
maximum epi thickness (and thus breakdown voltage) that can be
grown on Si without excessive wafer curvature, micro-cracking or
poor yield. MST can improve the growth of GaN epitaxy on Si
substrates by relieving biaxial tensile stress.
To read more about MST and Atomera’s offerings, please visit
www.atomera.com.
About Atomera
Atomera Incorporated is a semiconductor materials and technology
licensing company focused on deploying its proprietary,
silicon-proven technology into the semiconductor industry. Atomera
has developed Mears Silicon Technology™ (MST®), which increases
performance and power efficiency in semiconductor transistors. MST
can be implemented using equipment already deployed in
semiconductor manufacturing facilities and is complementary to
other nanoscaling technologies in the semiconductor industry
roadmap. More information can be found at www.atomera.com.
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