Demonstrating In-Line Raman Spectroscopy (Nova ELIPSON™) for
Nanosheet devices
REHOVOT, Israel, April 26,
2022 /PRNewswire/ -- Nova (Nasdaq:
NVMI) today announced that its co-authored paper with IBM
Research on "In-Line Raman Spectroscopy for Stacked Nanosheet
Device Manufacturing" has been selected as the winner of the Diana
Nyyssonen award for "best paper at SPIE's 2021 Advanced
Lithography Symposia." The award was granted to Nova and IBM on the
opening day of the 2022 conference. The paper is a result of a
continuous collaboration between the companies that drove numerous
innovative joint development programs to enhance advanced chip
manufacturing. The paper demonstrates the novel technologies Nova
promotes in advanced process control by utilizing its unique and
differentiated solutions. As part of the collaboration with IBM
Research, Nova installed its most advanced portfolio at IBM
Research's lab in Albany, New
York.
Monitoring and controlling strain in next-generation devices
within intricate nanoscale structures is a new challenge. A
suitable non-destructive and fast in-line technique is critical for
successful research and development and manufacturing. The joint
effort demonstrates in-line Raman spectroscopy for
non-destructive strain metrology at multiple critical process steps
throughout the front-end-of-line (FEOL) manufacturing cycle of
stacked nanosheet devices. This paper establishes the importance of
in-line Raman and support the growing demand for
materials metrology in high volume manufacturing.
"Our in-line Raman spectroscopy work with Nova supports critical
advances in logic scaling that offer new pathways of managing
strain metrology for nanosheet transistors," said Dr. Huiming Bu, Vice President, Hybrid Cloud
Technology Research & Albany Operations at IBM Research. "This
joint effort is indicative of the collaborative ecosystem IBM and
partners have cultivated in Albany
to steer our leading edge logic technology R&D
roadmap."
"We are honored to be selected for this prestigious award in
collaboration with IBM Research," said Dr. Shay Wolfling, Chief
Technology Officer of Nova. "controlling Nanosheets strain at
critical process steps is enabled by our innovative Nova
ELIPSONTM Raman Spectroscopy solution that is designed
to measure materials properties such as stress, crystallinity, and
surface properties for both Memory and Logic devices. The joint
work with IBM Research has demonstrated that through collaboration
with our customers, we can introduce new technologies, offering
groundbreaking solutions to enable the transition to
next-generation manufacturing."
About Nova:
Nova is a leading innovator and key provider of material,
optical and chemical metrology solutions for advanced process
control in semiconductor manufacturing. Nova delivers continuous
innovation by providing state-of-the-art high-performance metrology
solutions for effective process control throughout the
semiconductor fabrication lifecycle. Nova's product portfolio,
which combines high-precision hardware and cutting-edge software,
provides its customers with deep insight into developing and
producing the most advanced semiconductor devices. Nova's unique
capability to deliver innovative solutions enables its customers to
improve performance, enhance product yields and accelerate time to
market. Nova acts as a partner to semiconductor manufacturers from
its offices worldwide. Additional information may be found at
Nova's website link - https://www.novami.com/.
Nova is traded on Nasdaq & TASE, Nasdaq ticker symbol
NVMI.
Forward looking statement:
This press release contains forward-looking statements within
the meaning of safe harbor provisions of the Private Securities
Litigation Reform Act of 1995 relating to future events or our
future performance, such as statements regarding, but not limited
to, anticipated growth opportunities and projections about our
business and its future revenues, expenses and profitability.
Forward-looking statements involve known and unknown risks,
uncertainties and other factors that may cause our actual results,
levels of activity, performance or achievements to be materially
different from any future results, levels of activity, performance
or achievements expressed or implied in those forward-looking
statements. Factors that may affect our results, performance,
circumstances or achievements include, but are not limited to, the
following: catastrophic events such as the outbreak of COVID-19;
increased information technology security threats and sophisticated
computer crime; foreign political and economic risks; changes in
global trade policies; inability to protect intellectual property;
open source technology exposure; failure to compete effectively or
to respond to the rapid technological changes; consolidation in our
industry; difficulty to predict the length and strength of any
downturn or expansion period of the market we target; risks
associated with violations of environmental, safety and health
regulations; factors that adversely affect the pricing and demand
for our product lines; dependency on a small number of large
customers; dependency on a single manufacturing facility per
product line; dependency on a limited number of suppliers;
difficulty to integrate current or future acquisitions;
lengthy sales cycle and customer delays in orders; failures to
attract, recruit and retain qualified employees due to intense
competition for highly skilled personnel; political, economic, and
military instability in Israel;
risks related to our convertible notes; currency fluctuations; and
quarterly fluctuations in our operating results. We cannot
guarantee future results, levels of activity, performance or
achievements. The matters discussed in this press release also
involve risks and uncertainties summarized under the heading "Risk
Factors" in Nova's Annual Report on Form 20-F for the year ended
December 31, 2021 filed with the
Securities and Exchange Commission on March
1, 2022. These factors are updated from time to time through
the filing of reports and registration statements with the
Securities and Exchange Commission. Nova Ltd. does not assume any
obligation to update the forward-looking information contained in
this press release.
Company Contact:
Dror David, Chief Financial
Officer
Tel: +972-73-229-5760
E-mail: investors@novami.com
Nova Website Link - https://www.novami.com/
Investor Relations Contact:
Miri Segal
MS-IR LLC
Tel: +917-607-8654
E-mail: msegal@ms-ir.com
View original
content:https://www.prnewswire.com/news-releases/ibm-research-and-nova-jointly-awarded-the-best-metrology-paper-at-spie-advanced-lithography-conference-301532862.html
SOURCE Nova